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1

Chemical mechanical polishing (CMP) of on-axis Si-face 6H-SiC wafer for obtaining atomically flat defect-free surface

Pan, Guoshun, Zhou, Yan, Luo, Guihai, Shi, Xiaolei, Zou, Chunli, Gong, Hua

Journal:

Journal of Materials Science: Materials in Electronics

Year:

2013

Language:

english

File:

PDF, 1.04 MB

english, 2013

2

Chemical mechanical planarization (CMP) of on-axis Si-face SiC wafer using catalyst nanoparticles in slurry

Zhou, Yan, Pan, Guoshun, Shi, Xiaolei, Gong, Hua, Luo, Guihai, Gu, Zhonghua

Journal:

Surface and Coatings Technology

Year:

2014

Language:

english

File:

PDF, 1.71 MB

english, 2014

3

An in situ study of chemical-mechanical polishing behaviours on sapphire (0001) via simulating the chemical product-removal process by AFM-tapping mode in both liquid and air environments

Shi, Xiaolei, Xu, Li, Zhou, Yan, Zou, Chunli, Wang, Rongrong, Pan, Guoshun

Journal:

Year:

2018

Language:

english

File:

PDF, 5.60 MB

english, 2018

4

Study on the improved fuzzy clustering algorithm and its application in brain image segmentation

Ren, Tianbao, Wang, Huanhuan, Feng, Huilin, Xu, Chensheng, Liu, Guoshun, Ding, Pan

Journal:

Applied Soft Computing

Year:

2019

Language:

english

File:

PDF, 1.09 MB

english, 2019

5

Achieving ultralow surface roughness and high material removal rate in fused silica via a novel acid SiO2 slurry and its chemical-mechanical polishing mechanism

Shi, Xiao-Lei, Chen, Gaopan, Xu, Li, Kang, Chengxi, Luo, Guihai, Luo, Haimei, Zhou, Yan, Dargusch, Matthew S., Pan, Guoshun

Journal:

Applied Surface Science

Year:

2020

Language:

english

File:

PDF, 3.47 MB

english, 2020

6

Chemical Mechanical Polishing (CMP) of Fused Silica (FS) Using Ceria Slurry Recycling

Zhou, Yan, Luo, Haimei, Luo, Guihai, Chen, Gaopan, Kang, Chengxi, Pan, Guoshun

Journal:

ECS Journal of Solid State Science and Technology

Year:

2020

File:

PDF, 1.58 MB

2020

7

Particles detection and analysis of hard disk substrate after cleaning of post chemical mechanical polishing

Yating Huang, Xinchun Lu, Guoshun Pan, Bill Lee, Jianbin Luo

Journal:

Applied Surface Science

Year:

2009

Language:

english

File:

PDF, 369 KB

english, 2009

8

Structural and mechanical properties of nano-crystal TiN coatings

Chenhui Zhang, Guoshun Pan, Jianbin Luo, Wenzhi Li, Darong Chen

Journal:

SCIENCE CHINA Physics, Mechanics & Astronomy

Year:

2004

Language:

english

File:

PDF, 748 KB

english, 2004

9

Progress in material removal mechanisms of surface polishing with ultra precision

Jin Xu, Jianbin Luo, Xinchun Lu, Chaohui Zhang, Guoshun Pan

Journal:

Chinese Science Bulletin

Year:

2004

Language:

english

File:

PDF, 986 KB

english, 2004

10

Fabrication of Cu2ZnSnS4absorber layers with adjustable Zn/Sn and Cu/Zn+Sn ratios

Pan, Bin, Wei, Ming, Liu, Weifeng, Jiang, Guoshun, Zhu, Changfei

Journal:

Journal of Materials Science: Materials in Electronics

Year:

2014

Language:

english

File:

PDF, 1.42 MB

english, 2014

11

A study of chemical products formed on sapphire (0001) during chemical–mechanical polishing

Shi, Xiaolei, Pan, Guoshun, Zhou, Yan, Xu, Li, Zou, Chunli, Gong, Hua

Journal:

Surface and Coatings Technology

Year:

2015

Language:

english

File:

PDF, 6.05 MB

english, 2015

12

AFM and XPS studies on material removal mechanism of sapphire wafer during chemical mechanical polishing (CMP)

Zhou, Yan, Pan, Guoshun, Shi, Xiaolei, Gong, Hua, Xu, Li, Zou, Chunli

Journal:

Journal of Materials Science: Materials in Electronics

Year:

2015

Language:

english

File:

PDF, 1.41 MB

english, 2015

13

Characterization of sapphire chemical mechanical polishing performances using silica with different sizes and their removal mechanisms

Zhou, Yan, Pan, Guoshun, Gong, Hua, Shi, Xiaolei

Journal:

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Year:

2016

Language:

english

File:

PDF, 1.44 MB

english, 2016

14

Mechanical model of nanoparticles for material removal in chemical mechanical polishing process

Hao Chen,Dan Guo,Guoxin Xie,Guoshun Pan

Journal:

Year:

2016

Language:

english

File:

PDF, 1.77 MB

english, 2016

15

Study on Pad Performance Deterioration in Chemical Mechanical Polishing (CMP) of Fused Silica

Zhou, Yan, Luo, Haimei, Pan, Guoshun, Zou, Chunli, Luo, Guihai, Chen, Gaopan, Kang, Chengxi

Journal:

ECS Journal of Solid State Science and Technology

Year:

2018

Language:

english

File:

PDF, 733 KB

english, 2018

16

Application of surface analysis in study on removal mechanism and abrasive selection during fused silica chemical mechanical polishing

Chen, Gaopan, Luo, Haimei, Kang, Chengxi, Luo, Guihai, Zhou, Yan, Pan, Guoshun

Journal:

Surface and Interface Analysis

Year:

2019

Language:

english

File:

PDF, 1.74 MB

english, 2019

17

Characteristics of Slurry Recycling in Chemical Mechanical Polishing (CMP) of Fused Silica (FS)

Zhou, Yan, Luo, Haimei, Luo, Guihai, Kang, Chengxi, Chen, Gaopan, Pan, Guoshun

Journal:

ECS Journal of Solid State Science and Technology

Year:

2019

File:

PDF, 953 KB

2019

18

The Cycle Characteristics of Slurries in Chemical Mechanical Polishing (CMP) of Fused Silica

Kang, Chengxi, Gao, Bin, Guo, Dan, Luo, Haimei, Pan, Guoshun

Journal:

ChemistrySelect

Year:

2020

File:

PDF, 4.60 MB

2020

19

Surface modulation to enhance chemical mechanical polishing performance of sliced silicon carbide Si-face

Chen, Gaopan, Li, Jianguo, Long, Jiangyou, Luo, Haimei, Zhou, Yan, Xie, Xiaozhu, Pan, Guoshun

Journal:

Applied Surface Science

Year:

2021

File:

PDF, 7.49 MB

2021

20

Inhibitors for organic phosphonic acid system abrasive free polishing of Cu

Zhang Wei, Lu Xinchun, Liu Yuhong, Pan Guoshun, Luo Jianbin

Journal:

Applied Surface Science

Year:

2009

Language:

english

File:

PDF, 242 KB

english, 2009

21

Ultrasonic flexural vibration assisted chemical mechanical polishing for sapphire substrate

Wenhu Xu, Xinchun Lu, Guoshun Pan, Yuanzhong Lei, Jianbin Luo

Journal:

Applied Surface Science

Year:

2010

Language:

english

File:

PDF, 1.12 MB

english, 2010

22

Effects of the ultrasonic flexural vibration on the interaction between the abrasive particles; pad and sapphire substrate during chemical mechanical polishing (CMP)

Wenhu Xu, Xinchun Lu, Guoshun Pan, Yuanzhong Lei, Jianbin Luo

Journal:

Applied Surface Science

Year:

2011

Language:

english

File:

PDF, 1.25 MB

english, 2011

23

Study on the cyclotriphosphazene film on magnetic head surface

Luo Jianbin, Yang Mingchu, Zhang Chaohui, Pan Guoshun, Wen Shizhu

Journal:

Tribology International

Year:

2004

Language:

english

File:

PDF, 497 KB

english, 2004

24

Film Thickness of Ionic Liquids Under High Contact Pressures as a Function of Alkyl Chain Length

Huaping Xiao, Dan Guo, Shuhai Liu, Guoshun Pan, Xinchun Lu

Journal:

Tribology Letters

Year:

2011

Language:

english

File:

PDF, 631 KB

english, 2011

25

Synergistic roles of mixed inhibitors and the application of mixed complexing ligands in copper chemical mechanical polishing

Ning Wang, Guoshun Pan, Yan Liu

Journal:

Microelectronic Engineering

Year:

2011

Language:

english

File:

PDF, 500 KB

english, 2011

26

An empirical approach to explain the material removal rate for copper chemical mechanical polishing

Pan Guoshun, Wang Ning, Gong Hua, Liu Yan

Journal:

Tribology International

Year:

2012

Language:

english

File:

PDF, 365 KB

english, 2012

27

Preparation of silane modified SiO2 abrasive particles and their Chemical Mechanical Polishing (CMP) performances

GuoShun Pan, ZhongHua Gu, Yan Zhou, Tuo Li, Hua Gong, Yan Liu

Journal:

Year:

2011

Language:

english

File:

PDF, 593 KB

english, 2011

28

Contact ratio of rough surfaces with multiple asperities in mixed lubrication at high pressures

Huaping Xiao, Dan Guo, Shuhai Liu, Guoshun Pan, Xinchun Lu

Journal:

Applied Surface Science

Year:

2012

Language:

english

File:

PDF, 1.93 MB

english, 2012

29

Introduction of Burn-up Credit in Nuclear Criticality Safety Analysis

Guoshun You, Chunming Zhang, Xinyi Pan

Journal:

Procedia Engineering

Year:

2012

Language:

english

File:

PDF, 253 KB

english, 2012

30

Modification on the tribological properties of ceramics lubricated by water using fullerenol as a lubricating additive

YuHong Liu, XiaoKang Wang, PengXiao Liu, JunPeng Zheng, ChunYing Shu, GuoShun Pan, JianBin Luo

Journal:

Science China Technological Sciences

Year:

2012

Language:

english

File:

PDF, 754 KB

english, 2012

31

A comparative study between graphene oxide and diamond nanoparticles as water-based lubricating additives

YuHong Liu, XiaoKang Wang, GuoShun Pan, JianBin Luo

Journal:

Science China Technological Sciences

Year:

2013

Language:

english

File:

PDF, 687 KB

english, 2013

32

Effect of compact structure on the phase transition in the oxides derived Cu2ZnSnSe4 thin films

Chen, Guilin, Liu, Weifeng, Jiang, Guoshun, Pan, Bin, Zhu, Changfei

Journal:

Year:

2013

Language:

english

File:

PDF, 429 KB

english, 2013

33

Compression for smoothing and densifying CuInSe2 and Cu2ZnSnSe4 thin films coating from oxides nanoparticles precursor

Chen, Guilin, Pan, Bin, Jin, Lu, Jiang, Guoshun, Liu, Weifeng, Zhu, Changfei

Journal:

Journal of Alloys and Compounds

Year:

2014

Language:

english

File:

PDF, 669 KB

english, 2014

34

Characterization of colloidal silica abrasives with different sizes and their chemical–mechanical polishing performance on 4H-SiC (0001)

Shi, Xiaolei, Pan, Guoshun, Zhou, Yan, Gu, Zhonghua, Gong, Hua, Zou, Chunli

Journal:

Applied Surface Science

Year:

2014

Language:

english

File:

PDF, 9.05 MB

english, 2014

35

Selenization of mixed metal oxides for dense and ZnSe-free Cu2ZnSnSe4 absorber films

Deng, Yitao, Chen, Guilin, Pan, Bin, Li, JianMin, Jiang, Guoshun, Liu, Weifeng, Zhu, Changfei

Journal:

Journal of Alloys and Compounds

Year:

2014

Language:

english

File:

PDF, 892 KB

english, 2014

36

Extended study of the atomic step-terrace structure on hexagonal SiC (0001) by chemical-mechanical planarization

Shi, Xiaolei, Pan, Guoshun, Zhou, Yan, Zou, Chunli, Gong, Hua

Journal:

Applied Surface Science

Year:

2013

Language:

english

File:

PDF, 6.39 MB

english, 2013

37

The Assessment of Interface Adhesion of Cu/Ta/Black Diamond™/Si Films Stack Structure by Nanoindentation and Nanoscratch Tests

Liao, Chenglong, Guo, Dan, Wen, Shizhu, Lu, Xinchun, Pan, Guoshun, Luo, Jianbin

Journal:

Tribology Letters

Year:

2014

Language:

english

File:

PDF, 1012 KB

english, 2014

38

Synthesis of dual-doped non-precious metal electrocatalysts and their electrocatalytic activity for oxygen reduction reaction

Xu, Li, Pan, Guoshun, Liang, Xiaolu, Luo, Guihai, Zou, Chunli, Chen, Gaopan

Journal:

Journal of Energy Chemistry

Year:

2014

Language:

english

File:

PDF, 658 KB

english, 2014

39

Effect of Modified Silica Abrasive Particles on Nanosized Particle Deposition in Final Polishing of Silicon Wafers

Gong, Hua, Pan, Guoshun, Gu, Zhonghua, Zou, Chunli, Liu, Yan

Journal:

Tribology Transactions

Year:

2014

Language:

english

File:

PDF, 656 KB

english, 2014

40

XPS, UV–vis spectroscopy and AFM studies on removal mechanisms of Si-face SiC wafer chemical mechanical polishing (CMP)

Zhou, Yan, Pan, Guoshun, Shi, Xiaolei, Xu, Li, Zou, Chunli, Gong, Hua, Luo, Guihai

Journal:

Applied Surface Science

Year:

2014

Language:

english

File:

PDF, 1.76 MB

english, 2014

41

A modified decal method for preparing the membrane electrode assembly of proton exchange membrane fuel cells

Liang, Xiaolu, Pan, Guoshun, Xu, Li, Wang, Jiashu

Journal:

Year:

2015

Language:

english

File:

PDF, 1.84 MB

english, 2015

42

High-resolution electron microscopy analysis of Nd-Fe-B-type sintered magnets

Liu, Jinfang, Luo, Helie, Pan, Shuming, Sun, Yuan, Shi, Guoshun

Journal:

Journal of Applied Physics

Year:

1991

Language:

english

File:

PDF, 542 KB

english, 1991

43

A non-noble material cathode catalyst dual-doped with sulfur and nitrogen as efficient electrocatalysts for oxygen reduction reaction

Xu, Li, Pan, Guoshun, Shi, Xiaolei, Zou, Chunli, Zhou, Yan, Luo, Guihai, Chen, Gaopan

Journal:

Electrochimica Acta

Year:

2015

Language:

english

File:

PDF, 354 KB

english, 2015

44

[IEEE 2014 International Conference on Planarization/CMP Technology (ICPT) - Kobe, Japan (2014.11.19-2014.11.21)] Proceedings of International Conference on Planarization/CMP Technology 2014 - CMP of GaN using sulfate radicals generated by metal catalyst

Chunli, Zou, Guoshun, Pan, Li, Xu, Xiaolei, Shi, Liu, Yuyu

Year:

2014

Language:

english

File:

PDF, 550 KB

english, 2014

45

Investigation on the surface characterization of Ga-faced GaN after chemical-mechanical polishing

Gong, Hua, Pan, Guoshun, Zhou, Yan, Shi, Xiaolei, Zou, Chunli, Zhang, Suman

Journal:

Applied Surface Science

Year:

2015

Language:

english

File:

PDF, 2.15 MB

english, 2015

46

Fe-Nx/C assisted chemical–mechanical polishing for improving the removal rate of sapphire

Xu, Li, Zou, Chunli, Shi, Xiaolei, Pan, Guoshun, Luo, Guihai, Zhou, Yan

Journal:

Applied Surface Science

Year:

2015

Language:

english

File:

PDF, 990 KB

english, 2015

47

Probing Particle Movement in CMP with Fluorescence Technique

Lei, Jun, Guo, Dan, Luo, Jianbin, Pan, Guoshun

Journal:

Journal of The Electrochemical Society

Year:

2011

Language:

english

File:

PDF, 2.27 MB

english, 2011

48

[IEEE 2014 International Conference on Planarization/CMP Technology (ICPT) - Kobe, Japan (2014.11.19-2014.11.21)] Proceedings of International Conference on Planarization/CMP Technology 2014 - Realization of atomic-level smooth surface of sapphire (0001) by chemical-mechanical planarization with nano colloidal silica abrasives

Shi, Xiaolei, Pan, Guoshun, Zhou, Yan, Liu, Yuhong, Shi, Xiaolei, Pan, Guoshun, Zhou, Yan

Year:

2014

Language:

english

File:

PDF, 1.10 MB

english, 2014

49

Effects of ultra-smooth surface atomic step morphology on chemical mechanical polishing (CMP) performances of sapphire and SiC wafers

Zhou, Yan, Pan, Guoshun, Shi, Xiaolei, Zhang, Suman, Gong, Hua, Luo, Guihai

Journal:

Tribology International

Year:

2015

Language:

english

File:

PDF, 3.27 MB

english, 2015

50

[IEEE 2014 International Conference on Planarization/CMP Technology (ICPT) - Kobe, Japan (2014.11.19-2014.11.21)] Proceedings of International Conference on Planarization/CMP Technology 2014 - Atomically smooth gallium nitride surfaces generated by chemical mechanical polishing with non-noble metal catalyst(Fe-Nx/C) in acid solution

Xu, Li, Pan, Guoshun, Zou, Chunli, Shi, Xiaolei, Liu, Yuyu

Year:

2014

Language:

english

File:

PDF, 178 KB

english, 2014